---

VI Reunión Nacional de Materiales
San Sebastián (Spain). June 22-24th, 1999

Películas amorfas de SixCyN depositadas mediante ECR-PECVD

Subir

---

GDR Semiconducteurs à large bande interdite
CNRS Grenoble (FRANCE). May 21-23th, 2001.

Películas amorfas de SixCyN depositadas mediante ECR-PECVD

Subir

---

4ª Conferencia de dispositivos electrónicos
Calella-Barcelona (SPAIN). February 12-14th , 2003

Temporalmente no disponible
ECR- PECVD SiCN deposition on silicon substrates	SiON channel waveguides produced by Electron Cyclotron Resonance plasma deposition technique for sensors applications

Subir

---

3ª Reunión Española de OptoElectrónica
Leganés-Madrid (SPAIN). July 14-16th, 2003

SiON channel waveguides for sensor applications

 

Subir

---

International Conference on Silicon Carbide and Related Materials (ICSCRM03)
Lyon (FRANCE). October 5 -10th, 2003.

Low temperature ECR-PECVD microcrystalline SiC growth by pulsed gas flows

Subir

---

First International Meeting on Applied Physics (aphys2003)
Badajoz (SPAIN). October 13 -18th, 2003.

Silicon Oxynitride ECR-PECVD Films for Integrated Optics	Emission and absorption cross-section calculation of rare earth doped materials for applications to integrated optic devices

Subir

---

Seventh Expert Evaluation & Control of Compound Semiconductors Material & Technologies (EXMATEC'04)
Montpellier (FRANCE). June 1-4th, 2004.

Compound clusters in silicon dioxide obtained by N+, C+ and B+ high-dose ion implantation: nature of the blue cathodeluminiscence emission and relationship with the embedded phases.